激光增材制造TC4点阵结构化学抛光研究

马宁; 于忠浩

doi:10.3969/j.issn.2095-1248.2023.03.002

沈阳航空航天大学学报 ›› 2023, Vol. 40 ›› Issue (3) : 9 -15. DOI: 10.3969/j.issn.2095-1248.2023.03.002

机械与材料工程

激光增材制造TC4点阵结构化学抛光研究

马宁 ,
于忠浩

作者信息 +

Chemical polishing study of laser additive manufacturing TC4 dot matrix structure

Ning MA ,
Zhong-hao YU

Author information +

文章历史 +

PDF (2731K)

摘要

为了改善增材制造点阵结构的表面质量进而提升结构性能，研究了化学抛光过程中各加工参数对激光增材制造TC4点阵结构表面质量的影响。通过正交试验获得各加工参数对材料去除速率及材料表面粗糙度的影响趋势，得到优化的化学抛光参数。采用HF为3.5 mol/L、HNO₃为8 mol/L、脲素为40 g/L、十二烷基苯磺酸钠为2 g/L、溶液温度为35 ℃，化学抛光15 min时表面质量最佳，上表面粗糙度Ra由10.14 μm降至6.51 μm，侧表面粗糙度Ra由6.37 μm降至5.26 μm。试验结果表明，化学抛光能够有效地将点阵结构的表面增材缺陷去除，表面质量得到提升。

Abstract

In order to improve the surface quality of the additive manufacturing fractional structure and improve the structural performance， the influence of various processing parameters on the surface quality of the TC4 dot matrix structure in laser additive manufacturing was studied. Through orthogonal experiments， the influence trend of each processing parameter on the material removal rate and material surface roughness was obtained， and the optimized chemical polishing parameters were obtained. HF 3.5 mol/L， HNO₃ 8 mol/L， urea 40 g/L， sodium dodecylbenzenesulfonate 2 g/L， solution temperature 35 °C， chemical polishing was the best surface quality for 15min， upper surface roughness Ra decreased from 10.14μm to 6.51 μm， and side surface roughness Ra decreased from 6.37 μm to 5.26 μm. Tests have shown that chemical polishing can effectively remove the surface additive defects of the lattice structure and improve the surface quality.